Year | 2006 |
---|---|
Authors | Wen-Syang Hsu ,Cheng, P.L., Liao, C.I., Wu, H.R., Chen, Y.C., Chien, C.C., Yang, C.L., Tzou, S.F., Tang, J., Kodali, R., Washington, L., Cho, Y., Chang, V.C., Fu, T., and Hsu, W. |
Paper Title | Effective surface treatments for selective epitaxial SiGe growth in locally strained pMOSFETs |
Journal Title | J. of Semiconductor Science and Technology |
Issue.No | 22 |
Page(s) | 140-143 |
Level Type | SCI,EI |
Total Pages | 4 |
Language | English |