Year | 2021 |
---|---|
Authors | Tien-Kan (TK) Chung ,Sung-Lin Tsai, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Tien-Kan Chung, Edward Y. Chang, Kuniyuki Kakushima* |
Paper Title | Room-Temperature Deposition of a Poling-Free Ferroelectric AlScN Film by Reactive Sputtering |
Journal Title | Applied Physics Letters (RF: 37/155=23.87%, Physics, Applied, IF: 3.597) |
Vol.No | 8 |
Issue.No | 118 |
Page(s) | 082902- |
Level Type | SCI |
Total Pages | 4 |
Date of Publication | 2021-02-25 |
Language | English |