| Year | 2021 |
|---|---|
| Authors | Tien-Kan (TK) Chung ,Sung-Lin Tsai, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Tien-Kan Chung, Edward Y. Chang, Kuniyuki Kakushima* |
| Paper Title | Room-Temperature Deposition of a Poling-Free Ferroelectric AlScN Film by Reactive Sputtering |
| Journal Title | Applied Physics Letters (RF: 37/155=23.87%, Physics, Applied, IF: 3.597) |
| Vol.No | 8 |
| Issue.No | 118 |
| Page(s) | 082902- |
| Level Type | SCI |
| Total Pages | 4 |
| Date of Publication | 2021-02-25 |
| Language | English |
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