Year | 2014 |
---|---|
Authors | Wen-Syang Hsu ,Huang, Y.-T. and Hsu, W. |
Paper Title | A Simulation Model on Photoresist SU-8 Thickness after Development under Partial Exposure with Reflection Effect |
Journal Title | Japanese Journal of Applied Physics |
Vol.No | 53 |
Page(s) | 036505- |
Date of Publication | 2014-01-01 |
Language | English |