| Year | 2014 |
|---|---|
| Authors | Wen-Syang Hsu ,Huang, Y.-T. and Hsu, W. |
| Paper Title | A Simulation Model on Photoresist SU-8 Thickness after Development under Partial Exposure with Reflection Effect |
| Journal Title | Japanese Journal of Applied Physics |
| Vol.No | 53 |
| Page(s) | 036505- |
| Date of Publication | 2014-01-01 |
| Language | English |
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