| Year | 2011 |
|---|---|
| Project Category | Research Projects |
| Project Title | Polymer as inductively coupled plasma reactive ion etching sidewall protection layer to produce single crystal silicon suspended the development of micro-structure, process platform |
| Participator | Wen-Syang Hsu |
| Job Title | Principle investigator |
| Period | 2011.01 ~ 2012.01 |
| Unit | National Science Council |
| Note | {"en"=>nil, "zh_tw"=>nil} |
| Language | Chinese |
NYCU ME