Year | 2012 |
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Authors | Jong-Shinn Wu ,C.-T. Hung, K.-M. Lin, B.-R. Gu, J.-S. Wu* and G. C. Cheng |
Paper Title | Simulation of Large-scale Plasma Enhanced Chemical Vapor Deposition Process for Amorphous Silicon by a Very High-Frequency Power Source Using Parallel Fluid Modeling |
Conference Name | The joint meeting of 11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials) |
Location | Kyoto, Japan |
Peroid | Oct. 02-05, 2012 |