NYCU ME| Year | 2016 |
|---|---|
| Authors | Shao-Kang Hung ,Shao-Kang Hunga, Kung-Hsuan Linb, Cheng-Lung Chena, Chen-Hsun Choua, You-Chuan Lina |
| Author Type | First Author |
| Paper Title | Total-internal-reflection-based photomask for large-area photolithography |
| Journal Title | Optics & Laser Technology |
| Vol.No | 79 |
| Page(s) | 39-44 |
| Date of Publication | 2016-07-01 |
| Language | English |
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