Year | 2011 |
---|---|
Project Category | Research Projects |
Project Title | Polymer as inductively coupled plasma reactive ion etching sidewall protection layer to produce single crystal silicon suspended the development of micro-structure, process platform |
Participator | Wen-Syang Hsu |
Job Title | Principle investigator |
Period | 2011.01 ~ 2012.01 |
Unit | National Science Council |
Note | {"en"=>nil, "zh_tw"=>nil} |
Language | Chinese |