| Year | 2017 |
|---|---|
| Project Category | Research Projects |
| Project Title | Design of the total-internal-reflection-based soft photomask for large-area photolithography (II) |
| Participator | Shao-Kang Hung |
| Job Title | PI |
| Period | 2017.08 ~ 2018.07 |
| Unit | Ministry of science and technology |
| Language | English |
NYCU ME